The exponentially increasing capabilities of the microelectronic devices driven by “Moore’s law” have promoted a global semiconductor industry with a substantial economic scale and a high rate of growth over the past decades. Unfortunately this growth has resulted in increased use of toxic chemicals and intensive energy and water consumption.
With the aid of high throughput screening tools, we are developing a novel, low odor, and environmentally benign formulation in a wet process for semiconductor applications, which also reduces the usage of ultra pure water as compared to its previous generation. The design concept and surface chemistry of this approach will be presented in detail.